This simulation predicts how deep a layer of photopolymer resin cures when it is exposed to UV light in a digital light processing (DLP) 3D printer. Light enters the top of a 1 mm deep resin sample and is attenuated by a photoabsorber as it travels down; resin cures wherever the local exposure exceeds a critical value.
UV light at the resin surface (z = 0) has irradiance \(I_0\). The photoabsorber attenuates the light exponentially with depth:
The penetration depth is the depth at which the intensity falls to \(1/e\) (about 37%) of \(I_0\):
The incident exposure (energy dose per unit area at the surface) is
and the exposure at depth z is \(E(z) = E_0\exp(-z/D_p)\).
Resin cures where the local exposure exceeds the critical exposure \(E_c\). Setting \(E(C_d) = E_c\) gives the cure depth:
No curing takes place (\(C_d = 0\)) when \(E_0 \le E_c\).
Dissolved oxygen scavenges radicals, so the cure depth is lower than predicted by the Jacobs equation. This is modeled with an empirical exponent \(n\) on the irradiance:
where \(0.68 \le n \le 1\). The inhibition slider value \(s\) (0 to 1) sets \(n = 1 - 0.32\,s\); \(n = 1\) recovers the Jacobs equation.
| \(I_0\) | irradiance at the resin surface (mW/cm2) |
| \(I(z)\) | irradiance at depth z (mW/cm2) |
| \(t\) | exposure time (s) |
| \(E_0\) | incident exposure (mJ/cm2) |
| \(E_c\) | critical exposure for curing = 10 mJ/cm2 (fixed) |
| \(\varepsilon\) | absorptivity of the photoabsorber (natural-log basis) = 1000 M−1 cm−1 (fixed) |
| \([A]\) | photoabsorber concentration (M) |
| \(z\) | depth below the resin surface (μm) |
| \(D_p\) | penetration depth (μm) |
| \(C_d\) | cure depth (μm) |
| \(n\) | oxygen-inhibition exponent (dimensionless) |
| \(L\) | sample depth = 1 mm = 1000 μm |
The values of \(\varepsilon\) and \(E_c\) are typical of common acrylate photoinitiator systems.
This simulation was created in the Department of Chemical and Biological Engineering at University of Colorado Boulder for LearnChemE.com by Alexander Osterbaan under the direction of Professor Christopher N. Bowman. Address any questions or comments to LearnChemE@gmail.com.